Introduction

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed, it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently, there is significant worldwide research effort into so-called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently, most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches.

This book therefore aims to bring together the world's foremost resist development scientists from the various communities to produce in one place a definitive description of the many approaches to lithography fabrication.

Features

Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation.

Includes information on processing and metrology techniques.

Brings together multiple approaches to litho pattern recording from academia and industry in one place.