Ferroelectric Dielectrics Integrated on Silicon

Overview

This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.

Thermodynamic Theory and Thin Films

After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented.

Characterization Techniques

A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterization.

Reliability and Applications

An in-depth study of the influence of leakage currents is performed together with reliability discussion. Three applicative chapters cover integrated capacitors, variable capacitors, and ferroelectric memories.

Emerging Research

The final chapter deals with a reasonably new research field, multiferroic thin films.